A staple for any lab, the IR5 Fourier Transform Infrared (FTIR) Spectrometer is a high-performance benchtop instrument. Perfect for everyday analysis, it delivers fast, accurate IR measurements for all applications.

Highly modular photoluminescence spectrometer designed for ultimate sensitivity and versatility in steady-state and time-resolved photoluminescence research.

Carbon Nanotube Fibres, Fiber Diameter: 5-12 µm, Tensile Strength 1000-1200 MPa, Electrical conductivity 5×10^4~7×10^4 S/m Carbon nanotube fibers have moderate to high strengths. Also, they possess good electrical conductivity and very low density. Due to these properties, carbon nanotube fibers can be integrated into fabrics and composites. Their area of usage involves their use as stand-alone or embedded sensors. Moreover, their high strength, stiffness, thermal and electrical conductivity enable their use as functional reinforcements in composite materials, in active heating/cooling systems, electrical conductivity/EMI shielding mechanisms such as CNT/epoxy composites and in atmospheric anti-threat detection in UAVs.

Our graphene oxide is noted for its mechanical and thermal properties. The raw material - graphite - is chemically processed to obtain monolayer flakes of graphene oxide.

Graphenea offers custom manufacturing services for graphene-based devices. This enables fast device prototyping and accelerates the development towards your application or product.

Our Graphene Oxide is subjected to a rigorous QC in order to ensure a high quality and reproducibility. · Amount of residue on evaporation · pH control · Elemental Analysis If your application requires more specific quality control, please do not hesitate to contact us.

We are suppliers of high-performance/quality graphene and graphene products with a robust and proprietary manufacturing technology platform.

SIMON is specifically designed for routine measurement tasks. Its simple user interface and robustness of a fixed angle ellipsometer enables the entry to imaging ellipsometry. It can be operated in two different modes. The microscopic mode is very fast and allows visualisations of variations and defects in the thinnest layers (e.g., monolayers: d = 0.35 nm), whereas the ellipsometric mode measures thickness and the refractive index of the sample materials. Imaging Ellipsometry itself combines the sensitivity of thickness and refractive index measurements with the imaging capabilities of microscopy. This allows for determining thickness and refractive index variations with microscopic images of e.g., micro-structured samples. Typical applications include the surface inspection of homogeneities and defects in large samples in quality control or the fast localization of flakes of 2D materials.

Accurion EP4, our latest imaging ellipsometer, combines ellipsometry and microscopy for precise characterization of thickness and refractive index on microstructures as small as 1 µm. Unlike conventional ellipsometers, all structures inside the field of view are measured simultaneously. The EP4 provides ellipsometric-contrast live-view, allowing detection of sub-nm features and identification of regions of interest for obtaining values and 3D maps of thickness (0.1 nm - 10 µm) and refractive index. Additional accessories are available to expand measurements under controlled conditions or temperature variations.

Park NX-Wafer is the leading automated AFM system in the semiconductor industry. It offers comprehensive wafer fab inspection, defect review, and CMP profiling. Park NX-Wafer boasts the highest nanoscale surface resolution, consistent sub-angstrom height accuracy, and superior tip sharpness with minimal variation. Its features like auto tip exchange, live monitoring, markless target positioning, and automated analysis, make it a top-tier tool for semiconductor wafer applications.

Park NX-Hivac is a high vacuum AFM ideal for precise semiconductor failure analysis and sensitive materials research. Operating in a high vacuum environment, it delivers enhanced accuracy and repeatability, minimizing tip and sample damage. It's the key to a range of applications, including dopant concentration assessment using Scanning Spreading Resistance Microscopy (SSRM). With Park Systems’s intuitive Hivac Manager and automatic vacuum control, Park NX-Hivac streamlines the vacuum process and offers rapid vacuum conditions. Park NX-Hivac offers high-precision research in an oxygen-free vacuum environment.

Park NX12 is an all-in-one solution for nanoscale microscopy. It provides high-resolution imaging with diverse property measurement capabilities. It excels in electrochemistry research and is ideal for multi-user facilities serving a wide range of research disciplines. This adaptable platform covers a range of applications, from nanomechanical mapping, scanning ion conductance microscopy to inverted optical microscopy. Its flexibility is further enhanced by optional hardware and software add-ons, making it an ideal choice for analytical researchers and multi-user facility users.

The performance of a low distortion analog source and the precision of direct digital synthesis (DDS) is combined in the DS360. With less than 0.001 % total harmonic distortion (THD), 25 ppm frequency accuracy, and a broad range of features including sweeps and bursts, the DS360 is the ideal source for audio frequency applications.

In a collaboration with Prof. Dr. Ulrich Ratzinger of the J.-W. Goethe University a normal-conducting CH structure has been developed for the GSI in Darmstadt serving as a prototype for the planned 350 MHz proton linac which will accelerate to a final energy of 70 MeV. The total length will be in the order of 25 m. The particular efficiency of this structure is due to the compact design and the direct coupling of two individual CH resonators by means of an intermediate coupling cell which houses a compact quadrupole triplet for radial focusing. The prototype for GSI’s proton linac was the first normal conducting CH structure, followed by other structures of this kind: a cw structure for the FRANZ project, a highest field structure and a prototype for the CW-Linac of the MYRRHA project.

The R-IBE 450 is the enlarged version of the R-IBE 215. It can be used for IBE and R-IBE treatments. As a special feature this machine is able to perform subaperture etching.

The IBF 2000 is the world’s largest commercially available IBF machine and is capable of processing mirrors and optics up to a diameter of 2000mm, a thickness of max. 600mm and a total weight of 1.5t. The system is complemented by the turning device TD 2000 with which the optics can be positioned and aligned ergonomically on the workpiece holder.