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Product Overview
The FirstNano ET6000 is a multi-tube horizontal furnace system designed for batch wafer processing in R&D and pilot production. It can be configured with up to four independent process tubes, each capable of processing up to fifty 150mm wafers. The system supports both Atmospheric Pressure (APCVD) and Low-Pressure (LPCVD) processes and offers high-temperature options up to 1400°C. It is engineered for a variety of standard semiconductor thermal processes, including oxidation, annealing, diffusion, and the deposition of materials like polysilicon, silicon nitride, and various oxides (TEOS, PSG, BPSG).
Product Description
The FirstNano ET6000 is a multi-tube horizontal furnace system designed for batch wafer processing in R&D and pilot production. It can be configured with up to four independent process tubes, each capable of processing up to fifty 150mm wafers. The system supports both Atmospheric Pressure (APCVD) and Low-Pressure (LPCVD) processes and offers high-temperature options up to 1400°C. It is engineered for a variety of standard semiconductor thermal processes, including oxidation, annealing, diffusion, and the deposition of materials like polysilicon, silicon nitride, and various oxides (TEOS, PSG, BPSG).
Product Videos
CVD Equipment Corporation - First Nano
CVD Equipment Corporation - First Nano is the division of the company focused on providing turnkey chemical vapor deposition (CVD) and thermal processing systems for nanotechnology R&D. The division's EasyTube(R) systems are widely used in university and industrial labs for the synthesis of nanomaterials such as graphene, carbon nanotubes, and nanowires.
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