By AMT&C Group (Advanced Magnetic Technologies & Consulting Group)
SemiTEq’s MOCVD systems developed in cooperation with Russian leading teams of specialists with extensive experience and proven solutions in developing and exploitation of own-made MOCVD’s reactors SemiTEq’s MOCVD systems provide serial production of A3N epitaxial structures with high uniformity on substrates up to 150 mm. - A3N DRAGON 175 Modern MOCVD platform for A3N compounds growth - A3N STREAM 600 Modern MOCVD platform for A3N compounds growth Technological processes GaN thickness measurement results on wafer Ø150 mm AlGaN/GaN/SiC content uniformity measurement results on batch loading 3xØ3”
