NW
Structural & Compositional AnalysisCharacterization & Testing

Focused Ion Beam (FIB)

By Karlsruhe Nano Micro Facility (KNMF)

KNMFi Laboratory for Micro- and Nanostructuring Advanced SEM anaylsis, FIB slice&view and TEM sample preparation The FEI Strata 400S and the Zeiss Auriga 60 Dual Beam FIB are both a combination of a scanning electron microscope (SEM) and a focused ion beam (FIB) system, which allows imaging and structuring of materials at the nanoscale. The focused gallium ion beam can either be used for ion imaging or to cut predefined patterns or images in the surface of a solid. At the same time, the SEM can be used to image the nanostructures generated by FIB. In addition, it is possible to locally deposit C, Pt or W from precursor gases using the electron or ion beam. Additionally, Insulator Enhanced Etching (IEE) using XeF 2 is available. Equipment Tescan Solaris X Plasma FIB-SEM platform Zeiss Auriga 60 DualBeam FIB with EDX, EBSD and vacuum transfer system FEI Strata 400 DualBeam FIB with EDX