Ion beam sputter deposition (IBSD) is a process widely used in the optical coating industry. A broad, energetic beam of ions is directed towards a target. Atoms from the target are sputtered and directed towards the substrate. Low Chamber Pressure: The plasma in IBSD is housed within the ion source, so the chamber pressure can be maintained at a much lower level. In general, this technique reduces the level of contamination in the film. Purity of Film: the sample is not directly exposed to the ion beam, so less gas
