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Lithography & NanopatterningFabrication & Surface Engineering

Lithography Process

By Asia Pacific Microsystems Inc.

Lithography - Stepper 5:1 - G-line - Minimum feature: 1 µm - Alignment accuracy: 0.2 µm - Overlay - Contact aligner 1:1 - Minimum feature: 3 µm - Alignment accuracy: 2 µm (front side align) & 4 µm (front to back side align) - Spray coating - Lift-off - Special materials: Polyimide, BCB, SU8, PBO, LOR, Black PR