Pulsed Laser Deposition - PLD

By Nanocenter

PLD (Pulsed Laser Deposition) chamber and corresponding equipment. Manufacturer: TSST B.V. Year: 2012 Pulse laser application is a technique for preparing thin layers of predominantly inorganic nature. The supplied system is intended for layer-by-layer growth and thus enables the preparation of high-quality thin layers and structuring at the nanoscopic level. The system is equipped with the following main components: - Heating stand for laser and resistance heating of substrates, - target stand with line mode, - antechamber for transfer of samples and targets, - high-pressure reflective high-energy electron diffraction, - upgrade with UHV pumps (titanium sublimation pump, ion pump), - oxygen plasma source, - dust source (1 x 1.3 "target), - acceptor position with transfer rod. A KrF excimer laser with an energy of up to 700 mJ per pulse and a maximum pulse rate of 50 Hz is used to remove material from the target. An attenuator is used to set the laser energy, and a camera is used to diagnose it. Responsible person: dr. Matjaz Spreitzer, +386 (0) 1 477 3705, matjaz.spreitzer@ijs.si Equipment location: laboratories at the Department of Modern Materials, Jožef Stefan Institute, Jamova 39, 1000 Ljubljana Required level of knowledge: by agreement with the responsible person Equipment reservation: by arrangement with the responsible person