100mm Features: Aluminum BEOL, E-Beam Lithography, Alternative Substrates, High-K gate dielectric (HfO, TiO2, Alumina), Metal gate (TiN, W). 150mm Features: 0.5um Base line, Aluminum BEOL, i-Line Stepper. 200mm Features: 180nm Base line, Aluminum BEOL, KrF Stepper, i-Line Stepper, SiGe Epi, In-situ Doped Poly Si, High aspect ratio Si Hole, Deep Si Etch. 300mm Features: 65nm CMOS Baseline, Poly Si/SiON Gate Stack, Three Layer Cu & Low-K, Immersion Lithography, ELK, High-K Metal Gate.
