NW
Product EngineeringResearch & Engineering

Mask Layout

By Department of Nanoscale Science & Engineering, University at Albany

After simulation and modeling, the final designs of the devices are laid out using L-Edit to produce photo masks. L-Edit is a VLSI design tool; it is flexible enough to do micromachining design, printed circuit board layout and other CAD work. CNSE's professors and professional staff welcome the challenge of developing unique devices and processes with our partners.