By Swiss Nanoscience Institute
Manipulation and fabrication of nano-scaled samples. Focused Ion Beam (FIB) and Focused Electron Beam Induced Deposition (FEBID) technologies can be used for imaging, etching and depositing material (Pt, W, Co, C, Au, SCE) onto surfaces. With a Peltier heating and cooling system it is possible to adjust the temperature during the material deposition in situ in a temperature range from -60 °C to -120 °C. The ion beam is able to remove and cut material, allowing the internal structures of an object to be analyzed, while both the ion and/or the electron beam dissociates the precursor gas adsorbed on the surface leading to the growth of a deposit. FIB is also used for manipulation and fabrication of nanopatterns or to prepare ultra-thin samples (lamella) for TEM and STEM.
