By IONTOF GmbH
The detection and quantification of trace metals is an important analytical task in the semiconductor industry. TOF-SIMS is able to detect all elements (even the light ones) with isotope sensitivity. High mass resolution, high mass accuracy and good signal to noise ratio allow sensitivities down to 1E7 to 1E9 atoms/cm 2. The technique can be applied to patterned wafers and even to the backside of a wafer without loss in sensitivity. Quantification is done by using external standards with an accuracy comparable to other techniques such as TXRF or ICP-MS.
