By Nano-Chemika
Deposition of various metal-oxide layers of great uniformity and conformity can be performed on flat, as well as on 3D curved, substrates. Deposition is done at the temperature range of 50°C-250°C, allowing thus the use of photolithographic lift-off procedures. Ultrathin films down to 1 nm and up to100-200nm can be achieved with great uniformity. Metal Oxides such as ZrO, HfO (high K dielectrics) ZnO, Al 2 O 3, and TiO2 are available.
