By KMLabs
Background: As semiconductor devices continue to shrink while adopting increasingly complex architectures, accurate characterization of nanoscale features and interfaces has become one of the key challenges in process development and manufacturing. Conventional techniques such as SEM and AFM provide valuable information but are often limited by throughput, field of view, sample interaction, or their ability to characterize complex three-dimensional structures. Optical scatterometry has therefore become an important metrology technique since it offers fast, non-destructive measurements over statistically relevant sample areas. Specifications: multi-kHz rep rate; 20 to 120 eV; < 10 fs; 10 10 - 10 14 ph/s flux.
