A cladding oxide layer can be deposited onto the device if required. The deposition is performed using a plasma-enhanced chemical vapour deposition (PECVD) process. The standard oxide deposition thickness for MPW runs is 2.2 µm, which is sufficient for most thermal and optical isolation applications. The oxide deposition process can be combined with our tri-layer heater metallization process to fabricate thermo-optic photonic devices that can be controlled with temperature. Custom oxide thicknesses up to 3 µm can be requested but are subject to an additional surcharge. Please contact support@appliednt.com to inquire.
