NW
Lithography & NanopatterningFabrication & Surface Engineering

STU® – Simultaneous Thermal and UV

By Obducat Group

The patented STU®technology combines, in one imprint sequence, the simultaneous use of thermal- and UV based imprint processes. The STU®process allows for increased polymer flow rate giving a shorter process time as well as enabling improved material compatibility and thereby a wider selection of workable imprint materials.