This high performing measurement method uses white light interferometry, where a low pass filter blocks all light from 450 nm and below to protect photoresist from being exposed. - In-situ film thickness measurement in real-time enables immediate quality control and yield monitoring. - High speed wafer mapping with a programmable x-y stage can provide relevant data input towards root cause analysis of coating failures. The high performing measurement method uses white light interferometry, where a low pass filter blocks all light from 450 nm and below to protect photoresist from being exposed.
