A sputter depth profile involves removing material using an ion source and repeating this in a sequence with XPS analysis. Energetic ions are used to remove material from the sample. Over the last decade, significant advances have been made by using cluster ions for depth profiling. The cluster size and energy can be controlled to optimise sample sputtering and minimise ion induced chemical changes. The use of cluster ions generated by the Minibeam 6 Gas Cluster Ion Source (GCIS) has allowed successful depth profiling of organic polymer thin films and multilayer materials.
