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Lithography & NanopatterningFabrication & Surface Engineering

Compound Semiconductor Patterning

By Vistec Electron Beam GmbH

Our lithography systems are capable to directly pattern a huge variety of compound semiconductor materials with high reliability & stability which are needed in 24/7 production environments. Moreover, we offer the flexibility to use different substrate types at our machines and fully automated handling and alignment procedures for overlay exposures.