Custom diffraction gratings and calibration standards are fabricated using high-resolution electron beam lithography (EBL). These gratings feature structures at the nanometer scale, including 1D gratings with a 278 nm pitch (3600 lines/mm) and 2D gratings with a 463 nm pitch. The components are designed for calibrating high-magnification imaging systems like Atomic Force Microscopes (AFMs) and Scanning Electron Microscopes (SEMs), and for use in spectroscopy and other nanophotonics applications. They are available on various substrates, including silicon and fused silica.