Vmicro has a long term experience of microfabrication engineering with design rules from 100 nm to 100 µm. We are able to offer advanced lithography processes using e-beam and optical techniques. Optical lithography from 1 µm to 100µm E-beam lithography from 50 nm to 1µm Fast prototyping with e-beam lithography on large areas Wide range of resists: DUV, PMMA, Az nLOF, HSQ Proximity correction for dense patterns generation with 100kV ebeam Lithography sequences combining high resolution to thick resists. Mask engineering for deep etching of small structures