The Infinitesima Metron3D is an automated Atomic Force Microscopy (AFM) system designed for high-volume manufacturing (HVM) process control in the semiconductor industry. It is engineered for high-throughput, in-line metrology of nanoscale structures on wafers, with a capacity of up to 170 wafers per hour. The system integrates advanced features such as a large, automatically exchangeable probe library and 3-axis interferometry for sub-nanometer precision. Its primary applications include characterizing EUV resists, analyzing CMP (Chemical-Mechanical Planarization) performance, and metrology for the front-end-of-line (FEOL) in logic device fabrication.