By Laurell Technologies Corporation
Etch, Develop, or Cleaning requires backside rinse! The Back-Side Rinse injector, standard on all Laurell EDC ™ systems, prevents chemical and vapor impingement from the front-side process. An open or BSR chuck is needed to conduct the rinse effectively and is fully adjustable to accomodate most wafer sizes. Laurell has a long-standing reputation for leading the market, and the standardization on the need for back-side rinse is one of our proudest accomplishments.
Spin Coaters and Spin Processors. Models shown: Laurell EDC Spin Processor with Touch Control and foot switch, Laurell H6-8 Headless, Laurell EDC Spin Processor in Wet Station, Laurell H6-8 Spin Processor in Wet Station.
CATEGORY
Using the right chuck improves coating quality. High porosity chucks for standard cover slip sizes and embedded chucks for standard microscope slides are available direct from Laurell. If you have an unusual shape and/or size substrate, a custom chuck can be made for a perfect fit.
CATEGORY
Spin Coaters and Spin Processors. Models shown: Laurell H6-23 Headless, Laurell H6-23 with extended upper housing, Laurell WS-650-23 wet station, Laurell Spin Coater with Single Shot Dispenser (SSD).
CATEGORY
