By Laurell Technologies Corporation
Dynamically dispense your material linearly in a precise and consistent way Decrease chemical consumption by 50% or more Achieve better coating uniformity Allows programmed dispense, either center-to-edge or edge-to-center, in a straight line motion Simplifies sequential developing and etching processes Affordable, with no maintenance required
Spin Coaters and Spin Processors. Models shown: Laurell EDC Spin Processor with Touch Control and foot switch, Laurell H6-8 Headless, Laurell EDC Spin Processor in Wet Station, Laurell H6-8 Spin Processor in Wet Station.
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Using the right chuck improves coating quality. High porosity chucks for standard cover slip sizes and embedded chucks for standard microscope slides are available direct from Laurell. If you have an unusual shape and/or size substrate, a custom chuck can be made for a perfect fit.
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Spin Coaters and Spin Processors. Models shown: Laurell H6-23 Headless, Laurell H6-23 with extended upper housing, Laurell WS-650-23 wet station, Laurell Spin Coater with Single Shot Dispenser (SSD).
CATEGORY
