These jet sources are the basis of multiple jet, moving substrate processes for depositing metals, semiconductors, dielectrics, and organics, as well as oxides and nitrides in a “reactive” mode. All these materials can be grown by JVD in different forms: “atomistic” or “nanocluster”, multiple-layers, multi-component alloys, and “host-guest” films. In addition to solder deposition, JVD’s range of materials and applications are reviewed in Chapter 18 of the Handbook of Deposition Technologies for Films and Coatings, Third Edition, edited by Peter M. Martin.
