By Korea Advanced Nano Fab Center (KANC)
Supporting the demand of nano patterning(Class 1, NIST-A Zone) Supporting the process of mask stage by stage Photo: E-beam lithography I (9300) JBX9300FS(JEOL); E-beam lithography II (6000) JBX6000FS/E(JEOL); KrF Stepper PAS5500/300C(ASML); Mask Aligner(Auto) MA150e(Karl suss); Mask Aligner I (R&D) EVG620(EVG); E-beam curing machine ElctronCure 30TMx Measurement/Analysis: AFM I XE150(PSIA); FE SEM I S-4800(Hitachi)
