Silicon photonics, optical MEMS, and RF MEMS technologies demand specialized wafer processing and precise thin film integration. We support communication technology developers with the lithography, deposition, and etch processes these devices require. Our film lines handle the specialized materials these systems depend on: thick thermal oxide cladding layers, LPCVD silicon nitride waveguide films, PECVD oxide and nitride cladding stacks, and precious-metal deposition for optical MEMS. - Silicon photonics platforms and integrated photonic systems - Optical MEMS and thin film optical structures - RF MEMS components
