By SAMCO Inc.
Our deposition processes include Atomic Layer Deposition (ALD), Plasma Enhanced Chemical Vapor Deposition (CVD) including Anode PECVD and Cathode PECVD, and Diamond-Like Carbon (DLC) Coating. These methods allow us to achieve precise film growth with exceptional uniformity and thickness control. Whether it’s depositing thin films or creating extremely thick films, our deposition systems are designed to meet the stringent requirements of modern semiconductor manufacturing.
