By ATLANT 3D
Advancing optics, photonics, and next-generation displays with precision nanotechnology and Direct Atomic Layer Processing (DALP™). Atomic-Scale Control for Optical & Photonic Systems Scientists and engineers working at the boundaries of light manipulation face a fundamental challenge: bridging the gap between theoretical potential and physical implementation. By enabling direct atomic-layer processing of optical materials, new approaches to device architecture become possible. Beyond the Boundaries of Traditional Processing Shape Optical Properties - Engineer distributed Bragg reflectors with precise Q factors - Create optical filters with sub-20nm spectral resolution - Achieve transmission efficiencies approaching theoretical limits - Test multiple spectral profiles simultaneously Advance Photonic Integration - Pattern materials on non-planar surfaces - Maintain uniform coverage in high-aspect structures up to 60µm - Combine multiple optical materials in single process steps - Validate designs rapidly through direct fabrication Process Parameters - Vertical resolution: 0.3 nm steps - Current lateral precision: 400 µm - Processing temperature: RT to 300°C - Variable speed: 0.1-100 mm/s Material Systems - TiO₂: High-index optical components - MgF₂: Anti-reflective and UV applications - Pt: Reflective surfaces - V₂O₅: Active optical elements - CuO: Photovoltaic structures Platform Compatibility - Silicon - SiC - GaN wafers - Polymer substrates - Glass variants: Fused silica, Borosilicates Research Outcomes Validated hyperspectral imaging filters with Full-spectrum transmission characterization, Direct CMOS sensor integration, Quantified optical performance metrics Demonstrated multi-layer Bragg structures with controlled interfaces Explore Applications: Our team has validated multiple optical and photonic implementations: - Hyperspectral and multispectral imaging filters - High-Q distributed Bragg reflectors - Anti-reflective coatings - Thermochromic windows - Photovoltaic structures
