By Shanghai Huali Microelectronics Corporation (HLMC)
The chemical laboratory provides timely and accurate chemical analysis services for the plants and research and development of processes. The chemical laboratory has put in place a well-established analytical testing process and is able to customize the development and analytical method according to the customer's analytical needs, and can provide the customers with analysis services on a 24/7 basis. The chemical analysis laboratory is equipped with a full set of analytical equipment that is mainly used in the semiconductor industry: - Vapor phase etching (VPD) and inductively coupled plasma mass spectrometry (ICP-MS): the vapor phase etching (VPD) and inductively coupled plasma mass spectrometry (ICP-MS) can detect the metal content of chemicals as low as ppt, with the detection limit of metal ion content on the surface of silicon wafer of 1.0. E8 atom/cm 2 - Gas chromatography-mass spectrometry (GC-MS): the gas chromatography-mass spectrometry can detect the total volatile organic compound (TVOC) content with a detection limit of 0.1 ng/L - Ion chromatograph (IC): the ion chromatograph (IC) can detect the yin and yang ion content with a detection limit of 0.1ppb - Automatic titrator: the automatic titrator can monitor the chemical concentration accurate to 0.001% (one hundred thousandth)
